Invention Grant
- Patent Title: Resin composition for stereolithographic modeling
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Application No.: US17612862Application Date: 2020-05-21
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Publication No.: US11981763B2Publication Date: 2024-05-14
- Inventor: Kenji Suzuki , Misaki Ito
- Applicant: KURARAY NORITAKE DENTAL INC.
- Applicant Address: JP Kurashiki
- Assignee: KURARAY NORITAKE DENTAL INC.
- Current Assignee: KURARAY NORITAKE DENTAL INC.
- Current Assignee Address: JP Kurashiki
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP 19095520 2019.05.21
- International Application: PCT/JP2020/020096 2020.05.21
- International Announcement: WO2020/235628A 2020.11.26
- Date entered country: 2021-11-19
- Main IPC: C08F2/46
- IPC: C08F2/46 ; B29C64/124 ; B33Y10/00 ; B33Y70/00 ; C08F2/50 ; C08F265/06 ; C08G61/04 ; C08K3/36 ; C08K5/14 ; C08K5/54 ; C08K9/06 ; B29K105/00 ; B29K105/16

Abstract:
The present invention provides a resin composition for stereolithographic modeling emitting a weak odor, having desirable shape accuracy, and made into a cured product having desirable strength, toughness, and color tone when used for stereolithographic modeling. The present invention relates to a resin composition for stereolithographic modeling, comprising: a polymerizable monomer (A); a photopolymerization initiator (B), and an organic peroxide (C), wherein the polymerizable monomer (A) comprises a (meth)acrylic acid ester compound (A-1) having a viscosity of 1,000 mPa·s or less and a normal boiling point of 270° C. or more and/or a (meth)acrylamide compound (A-2) having a viscosity of 1,000 mPa·s or less and a normal boiling point of 200° C. or more, and the photopolymerization initiator (B) is at least one selected from a (bis)acylphosphine oxide, an α-hydroxyketone compound, an α-aminoketone compound, a benzoin alkyl ether compound, a thioxanthone, a ketal, an α-diketone, and an anthraquinone.
Public/Granted literature
- US20220251275A1 RESIN COMPOSITION FOR STEREOLITHOGRAPHIC MODELING Public/Granted day:2022-08-11
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