Invention Grant
- Patent Title: Vertical inductor for WLCSP
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Application No.: US17566529Application Date: 2021-12-30
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Publication No.: US11984246B2Publication Date: 2024-05-14
- Inventor: Andreas Wolter , Thorsten Meyer , Gerhard Knoblinger
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- The original application number of the division: US16367200 2019.03.27
- Main IPC: H01F17/00
- IPC: H01F17/00 ; H01F41/04 ; H01L23/00 ; H01L23/522 ; H01L23/64 ; H01F27/28

Abstract:
Embodiments of the invention include a microelectronic device and methods of forming a microelectronic device. In an embodiment the microelectronic device includes a semiconductor die and an inductor that is electrically coupled to the semiconductor die. The inductor may include one or more conductive coils that extend away from a surface of the semiconductor die. In an embodiment each conductive coils may include a plurality of traces. For example, a first trace and a third trace may be formed over a first dielectric layer and a second trace may be formed over a second dielectric layer and over a core. A first via through the second dielectric layer may couple the first trace to the second trace, and a second via through the second dielectric layer may couple the second trace to the third trace.
Public/Granted literature
- US20220122756A1 VERTICAL INDUCTOR FOR WLCSP Public/Granted day:2022-04-21
Information query
IPC分类:
H | 电学 |
H01 | 基本电气元件 |
H01F | 磁体;电感;变压器;磁性材料的选择 |
H01F17/00 | 信号类型的固定电感器 |