Invention Grant
- Patent Title: Semiconductor device with capacitors having different dielectric layer heights
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Application No.: US17565248Application Date: 2021-12-29
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Publication No.: US11984446B2Publication Date: 2024-05-14
- Inventor: Kyu Jin Choi , Seong Min Ma , Kyu Chan Shim
- Applicant: SK hynix Inc.
- Applicant Address: KR Gyeonggi-do
- Assignee: SK hynix Inc.
- Current Assignee: SK hynix Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: IP & T GROUP LLP
- Priority: KR 20210095796 2021.07.21
- Main IPC: H01L27/08
- IPC: H01L27/08 ; H01L49/02

Abstract:
A semiconductor device may include a first capacitor and a second capacitor. The first capacitor may include a first lower electrode, a first upper electrode and a first dielectric layer disposed between the first lower electrode and the first upper electrode at a first height. The second capacitor may be positioned spaced apart from the first capacitor. The second capacitor may include a second lower electrode, a second upper electrode and a second dielectric layer disposed between the second lower electrode and the second upper electrode at a second height different from the first height.
Public/Granted literature
- US20230024352A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2023-01-26
Information query
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