Invention Grant
- Patent Title: Method and apparatus for determining exposure parameter of head-mounted device, and device
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Application No.: US17763000Application Date: 2021-08-24
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Publication No.: US11985430B2Publication Date: 2024-05-14
- Inventor: Tao Wu
- Applicant: QINGDAO PICO TECHNOLOGY CO., LTD.
- Applicant Address: CN Shandong
- Assignee: QINGDAO PICO TECHNOLOGY CO., LTD.
- Current Assignee: QINGDAO PICO TECHNOLOGY CO., LTD.
- Current Assignee Address: CN
- Priority: CN 2010857729.6 2020.08.24
- International Application: PCT/CN2021/114365 2021.08.24
- International Announcement: WO2022/042567A 2022.03.03
- Date entered country: 2022-03-23
- Main IPC: H04N23/73
- IPC: H04N23/73 ; H04N23/71 ; H04N23/76

Abstract:
A method and apparatus for determining an exposure parameter of a head-mounted device, and a device are provided. The method includes: acquiring an average real brightness value of a region of interest of the image of the current frame; determining an average predicted brightness value of a region of interest of an image of a next frame if the average predicted brightness value is smaller than a lower limit of a first preset threshold range, sequentially selecting exposure parameter values equal to or greater than a current exposure parameter value, in a target exposure list to form a target exposure sub-list; and if the average predicted brightness value is greater than or equal to an upper limit of the first preset threshold range, sequentially selecting exposure parameter values equal to or smaller than the current exposure parameter value in the target exposure list to form a target exposure sub-list.
Public/Granted literature
- US20220417411A1 METHOD AND APPARATUS FOR DETERMINING EXPOSURE PARAMETER OF HEAD-MOUNTED DEVICE, AND DEVICE Public/Granted day:2022-12-29
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