Invention Grant
- Patent Title: Fine particle production apparatus and fine particle production method
-
Application No.: US17615775Application Date: 2020-06-04
-
Publication No.: US11986885B2Publication Date: 2024-05-21
- Inventor: Yasunori Tanaka , Naoto Kodama , Kazuki Onda , Shu Watanabe , Keitaro Nakamura , Shiori Sueyasu
- Applicant: NATIONAL UNIVERSITY CORPORATION KANAZAWA UNIVERSITY , NISSHIN SEIFUN GROUP INC.
- Applicant Address: JP Kanazawa
- Assignee: NATIONAL UNIVERSITY CORPORATION KANAZAWA UNIVERSITY,NISSHIN SEIFUN GROUP INC.
- Current Assignee: NATIONAL UNIVERSITY CORPORATION KANAZAWA UNIVERSITY,NISSHIN SEIFUN GROUP INC.
- Current Assignee Address: JP Ishikawa; JP Tokyo
- Agency: MUNCY, GEISSLER, OLDS & LOWE, P.C.
- Priority: JP 19105218 2019.06.05
- International Application: PCT/JP2020/022164 2020.06.04
- International Announcement: WO2020/246551A 2020.12.10
- Date entered country: 2021-12-01
- Main IPC: B22F9/14
- IPC: B22F9/14 ; B22F9/12 ; H05H1/42

Abstract:
Provided are a fine particle production apparatus and a fine particle production method that can control the particle sizes of fine particles, and efficiently produce a large amount of fine particles having good particle size uniformity. The present invention comprises: a raw material supply unit which supplies raw materials for fine particle production into thermal plasma flame; a plasma torch in which the thermal plasma flame is generated, and which evaporates the raw material supplied by the raw material supply unit by means of the thermal plasma flame to form a mixture in a gas phase state; and a plasma generation unit which generates thermal plasma flame inside the plasma torch. The plasma generation unit includes: a first coil which surrounds the plasma torch, a second coil which is installed below the first coil in the longitudinal direction of the plasma torch and surrounds the circumference of the plasma torch; a first power supply unit which supplies an amplitude-modulated first high-frequency current to the first coil; and a second power supply unit which supplies an amplitude-modulated second high-frequency current to the second coil. The degree of modulation of the first high-frequency current is smaller than the degree of modulation of the second high-frequency current.
Public/Granted literature
- US20220219236A1 FINE PARTICLE PRODUCTION APPARATUS AND FINE PARTICLE PRODUCTION METHOD Public/Granted day:2022-07-14
Information query