Invention Grant
- Patent Title: Organopolysiloxane composition for forming pressure sensitive adhesive layer, and use of same
-
Application No.: US17267351Application Date: 2019-08-13
-
Publication No.: US11987731B2Publication Date: 2024-05-21
- Inventor: Maki Itoh , Akihiro Nakamura , Michitaka Suto
- Applicant: DOW TORAY CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: DOW TORAY CO., LTD.
- Current Assignee: DOW TORAY CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Warner Norcross + Judd LLP
- Priority: JP 18151131 2018.08.10
- International Application: PCT/JP2019/031808 2019.08.13
- International Announcement: WO2020/032285A 2020.02.13
- Date entered country: 2021-05-19
- Main IPC: C09J183/04
- IPC: C09J183/04 ; B32B7/06 ; B32B7/12 ; B32B27/08 ; C08G77/00 ; C08G77/08 ; C08G77/16 ; C08G77/20 ; C08G77/22 ; C09J7/38

Abstract:
A curable organopolysiloxane composition is provided which forms a pressure sensitive adhesive (PSA) layer having a low storage elastic modulus (G′), excellent curability, and sufficient adhesion, along with applications thereof. A PSA layer-forming organopolysiloxane composition comprises: (A) a chain organopolysiloxane having alkenyl groups; (B) an organopolysiloxane resin wherein the weight average molecular weight (Mw) thereof is less than 4500 and the sum of the content of hydroxyl groups, etc. is 9 mole % or less; (C) an organohydrogenpolysiloxane; and (D) a hydrosilylation reaction catalyst; and optionally, (A′) a chain organopolysiloxane which does not contain a carbon-carbon double bond-containing reactive group in the molecule. The mass ratio of the organopolysiloxane resin (B) to the chain organopolysiloxane (A) is within a specific range and the shear storage elastic modulus G′ at −20° C. of a PSA layer obtained by curing the composition is within a range of 0.01 to 1.0 MPa.
Public/Granted literature
- US20210284888A1 ORGANOPOLYSILOXANE COMPOSITION FOR FORMING PRESSURE SENSITIVE ADHESIVE LAYER, AND USE OF SAME Public/Granted day:2021-09-16
Information query
IPC分类: