Invention Grant
- Patent Title: Semiconductor device having conductive patterns with mesh pattern and differential signal wirings
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Application No.: US18163617Application Date: 2023-02-02
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Publication No.: US11990397B2Publication Date: 2024-05-21
- Inventor: Wataru Shiroi , Shuuichi Kariyazaki
- Applicant: RENESAS ELECTRONICS CORPORATION
- Applicant Address: JP Tokyo
- Assignee: RENESAS ELECTRONICS CORPORATION
- Current Assignee: RENESAS ELECTRONICS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Rimon P.C.
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L23/00

Abstract:
A semiconductor device comprising a wiring member with which a semiconductor chip is electrically connected including: a first wiring layer having a plurality of first conductive patterns; a second wiring layer arranged next to the first wiring layer in a thickness direction of the wiring member, and having a second conductive pattern; and a third wiring layer arranged next to the second wiring layer in the thickness direction of the wiring member, and having a third conductive pattern. Here, in plan view, a first opening portion of each of two, which are arranged next to each other, of a plurality of first opening portions each penetrating through the second conductive pattern is overlapped with a pair of differential signal wirings contained in plurality of first conductive patterns, and is overlapped with two or more of a plurality of second opening portions each penetrating through the third conductive pattern.
Public/Granted literature
- US20230187330A1 SEMICONDUCTOR DEVICE HAVING CONDUCTIVE PATTERNS WITH MESH PATTERN AND DIFFERENTIAL SIGNAL WIRINGS Public/Granted day:2023-06-15
Information query
IPC分类: