- Patent Title: Semiconductor memory devices and methods of fabricating the same
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Application No.: US17460814Application Date: 2021-08-30
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Publication No.: US11991885B2Publication Date: 2024-05-21
- Inventor: Sung-Min Hwang , Joon-Sung Lim , Eunsuk Cho
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: HARNESS, DICKEY & PIERCE, P.L.C.
- Priority: KR 20170073390 2017.06.12 KR 20170146813 2017.11.06
- The original application number of the division: US15982001 2018.05.17
- Main IPC: H10B43/40
- IPC: H10B43/40 ; H01L25/065 ; H01L29/423 ; H01L29/66 ; H10B43/27 ; H10B43/35 ; H10B43/50

Abstract:
A semiconductor memory device includes a first semiconductor chip and a second semiconductor chip. Each semiconductor chip of the first and second semiconductor chips may include a cell array region and a peripheral circuit region. The cell array region may include an electrode structure including electrodes sequentially stacked on a body conductive layer and vertical structures extending through the electrode structure and connected to the body conductive layer. The peripheral circuit region may include a residual substrate on the body conductive layer and on which a peripheral transistor is located. A bottom surface of the body conductive layer of the second semiconductor chip may face a bottom surface of the body conductive layer of the first semiconductor chip.
Public/Granted literature
- US20210391349A1 SEMICONDUCTOR MEMORY DEVICES AND METHODS OF FABRICATING THE SAME Public/Granted day:2021-12-16
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