Invention Grant
- Patent Title: Enhanced particle deposition system and method
-
Application No.: US16577045Application Date: 2019-09-20
-
Publication No.: US11993532B2Publication Date: 2024-05-28
- Inventor: David McDonald Stirling
- Applicant: ASI/Silica Machinery, LLC
- Applicant Address: US CA Los Angeles
- Assignee: ASI/SILICA MACHINERY, LLC
- Current Assignee: ASI/SILICA MACHINERY, LLC
- Current Assignee Address: US CA Los Angeles
- Agency: Norton Rose Fulbright US LLP
- Main IPC: C03B37/014
- IPC: C03B37/014

Abstract:
A deposition system for depositing a chemical vapor onto a workpiece is disclosed, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The workpiece is held by a lathe that rotates the workpiece relative to chemical burners that deposit silica soot on the workpiece. The deposition system has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber. Multiple sets of chemical burners are disposed longitudinally along the length of the workpiece. Each set of burners is separated from other sets, such that each set of burners deposit silica particles onto generally different portions of a workpiece. The respective portions include an overlap segment in which one or more burners from one burner set will deposit silica particles on the same portion of the workpiece as one or more burners from another set.
Public/Granted literature
- US20200255322A1 Enhanced Particle Deposition System and Method Public/Granted day:2020-08-13
Information query