Invention Grant
- Patent Title: Mask and method of manufacturing the same, and mask assembly
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Application No.: US17055508Application Date: 2020-03-11
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Publication No.: US11993839B2Publication Date: 2024-05-28
- Inventor: Yong Zheng , Shuai Du , Wenbiao Ding
- Applicant: CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. , BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Sichuan
- Assignee: CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Sichuan; CN Beijing
- Agency: Procopio, Cory, Hargreaves & Savitch LLP
- Priority: CN 1910244878.2 2019.03.28
- International Application: PCT/CN2020/078723 2020.03.11
- International Announcement: WO2020/192420A 2020.10.01
- Date entered country: 2020-11-13
- Main IPC: C23C14/04
- IPC: C23C14/04 ; B05C21/00 ; C23C14/24 ; C25D1/10 ; C25D3/38 ; C25D3/54 ; H10K71/16

Abstract:
A mask has a mask pattern region and a non-mask pattern region located at a peripheral of the mask pattern region. The mask pattern region includes at least one effective mask region. In any effective mask region, the mask includes a plurality of evaporation holes and at least one shielding; strip. Each shielding, strip is located between two adjacent evaporation holes. The mask has at least one welding region in the non-mask pattern region. A thickness of a portion of the mask in the non-mask pattern region and at least in the welding region is greater than a thickness of the shielding strip of the mask in the effective mask region, and the thickness refers to a dimension of the corresponding portion along a direction perpendicular to a plane where the mask is located.
Public/Granted literature
- US20210123129A1 MASK AND METHOD OF MANUFACTURING THE SAME, AND MASK ASSEMBLY Public/Granted day:2021-04-29
Information query
IPC分类: