Invention Grant
- Patent Title: Real-time, non-invasive IEDF plasma sensor
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Application No.: US17715672Application Date: 2022-04-07
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Publication No.: US11996274B2Publication Date: 2024-05-28
- Inventor: Linnell Martinez , David Miller , Eldridge Mount, IV , Peter Paul , Aaron Radomski
- Applicant: MKS Instruments, Inc.
- Applicant Address: US MA Andover
- Assignee: MKS Instruments, Inc.
- Current Assignee: MKS Instruments, Inc.
- Current Assignee Address: US MA Andover
- Agency: Harness, Dickey & Pierce, P.L.C.
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
A controller for a plasma generation system includes a model evaluation module receives a sensed value that varies in accordance with a state of a plasma controlled by a RF power generator. The model evaluation module generates a plasma parameter that varies in accordance with the sensed value. A model integration module receives the plasma parameter, integrates the plasma parameter, and outputs an integrated model parameter. An IEDF evaluation module receives the integrated model parameter and generates an ion energy distribution function (IEDF) in accordance with the integrated model parameter. An IEDF controller module receives the IEDF and generates a signal for controlling a RF generator. A RF generator control module receives the signal and generates an RF generator control signal to control at least one of power, frequency, or phase of the RF power generator.
Public/Granted literature
- US20230326727A1 Real-Time, Non-Invasive IEDF Plasma Sensor Public/Granted day:2023-10-12
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