- Patent Title: Trench-gate MOS transistor and method for manufacturing the same
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Application No.: US17583050Application Date: 2022-01-24
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Publication No.: US11996458B2Publication Date: 2024-05-28
- Inventor: Hiroyuki Kishimoto , Hiroaki Katou , Toshifumi Nishiguchi , Saya Shimomura , Kouta Tomita
- Applicant: Kabushiki Kaisha Toshiba , Toshiba Electronic Devices & Storage Corporation
- Applicant Address: JP Tokyo
- Assignee: KABUSHIKI KAISHA TOSHIBA,TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION
- Current Assignee: KABUSHIKI KAISHA TOSHIBA,TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION
- Current Assignee Address: JP Tokyo; JP Tokyo
- Agency: Maier & Maier, PLLC
- Priority: JP 19238876 2019.12.27
- Main IPC: H01L29/423
- IPC: H01L29/423 ; H01L29/40 ; H01L29/417 ; H01L21/28

Abstract:
A semiconductor device includes a semiconductor part; first and second electrodes respectively on back and front surfaces of the semiconductor part; and a control electrode between the semiconductor part and the second electrode. The control electrode is provided inside a trench of the semiconductor part. The control electrode is electrically insulated from the semiconductor part by a first insulating film and electrically insulated from the second electrode by a second insulating film. The control electrode includes an insulator at a position apart from the first insulating film and the second insulating film. The semiconductor part includes a first layer of a first conductivity type provided between the first and second electrodes, the second layer of a second conductivity type provided between the first layer and the second electrode and the third layer of the first conductivity type selectively provided between the second layer and the second electrode.
Public/Granted literature
- US20220149168A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2022-05-12
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