Invention Grant
- Patent Title: Gas control device
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Application No.: US17805085Application Date: 2022-06-02
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Publication No.: US12000389B2Publication Date: 2024-06-04
- Inventor: Masaaki Fujisaki
- Applicant: Murata Manufacturing Co., Ltd.
- Applicant Address: JP Kyoto
- Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee Address: JP Kyoto
- Agency: Pearne & Gordon LLP
- Priority: JP 16016952 2016.02.01
- The original application number of the division: US16050190 2018.07.31
- Main IPC: F04B45/047
- IPC: F04B45/047 ; F04B39/12 ; F04B41/06

Abstract:
A gas control device includes a first pump, a second pump, and a connection casing. The first pump includes a first pump casing, a first suction hole, and a first discharge hole. The first pump casing has a plurality of outer walls. The second pump includes a second pump casing, a second suction hole, and a second discharge hole. The connection casing has a first opening and a second opening. The connection casing forms, together with the first pump casing and the second pump casing, a first closed space. The second discharge hole and the first suction hole communicate with each other via the first closed space. The first pump and the second pump are connected in series with each other. The outer wall in which first suction hole is provided faces the first closed space.
Public/Granted literature
- US20220290665A1 GAS CONTROL DEVICE Public/Granted day:2022-09-15
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