Invention Grant
- Patent Title: Electronic device
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Application No.: US18314995Application Date: 2023-05-10
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Publication No.: US12001109B2Publication Date: 2024-06-04
- Inventor: Chung-Wen Yen , Yu-Tsung Liu , Chao-Hsiang Wang , Te-Yu Lee
- Applicant: InnoLux Corporation
- Applicant Address: TW Miao-Li County
- Assignee: INNOLUX CORPORATION
- Current Assignee: INNOLUX CORPORATION
- Current Assignee Address: TW Miao-Li County
- Agency: McClure, Qualey & Rodack, LLP
- Priority: TW 4128305 2015.08.28
- Main IPC: G02F1/1368
- IPC: G02F1/1368 ; G02F1/1362 ; H01L27/12 ; G02F1/1333 ; G02F1/136

Abstract:
The electronic device includes a substrate; an active layer disposed above the first substrate; a first signal line disposed above the substrate; and a conductive pattern. The conductive pattern is in electrical contact with the active layer, wherein the conductive pattern includes a first side extending in a first direction, a second side extending in the first direction, and a third side connected between the first side and the second side, and wherein the third side includes a part that the part is not parallel to the first direction and not perpendicular to the first direction, and the part is located out of the first signal line.
Public/Granted literature
- US20230273491A1 ELECTRONIC DEVICE Public/Granted day:2023-08-31
Information query
IPC分类: