Invention Grant
- Patent Title: Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask
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Application No.: US18382356Application Date: 2023-10-20
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Publication No.: US12001133B2Publication Date: 2024-06-04
- Inventor: Takuma Kato , Daijiro Akagi , Takeshi Okato , Ryusuke Oishi , Yusuke Ono
- Applicant: AGC Inc.
- Applicant Address: JP Tokyo
- Assignee: AGC Inc.
- Current Assignee: AGC Inc.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP 22061684 2022.04.01
- Main IPC: G03F1/24
- IPC: G03F1/24 ; G03F1/48 ; G03F1/52 ; G03F1/54 ; G03F1/78 ; G03F1/80

Abstract:
A reflective mask blank includes a substrate; a multilayer reflective film that reflects EUV light; a protection film that protects the multilayer reflective film; and an absorption film that absorbs the EUV light, in this order. The protection film contains 50 at % or more of Rh. When a band-shaped gray scale image parallel to an interface between the protection film and the multilayer reflective film is obtained by imaging a cross section of the protection film with a transmission electron microscope (TEM) and a luminance profile of the gray scale image in a longitudinal direction of the gray scale image is created, a number of peaks of the luminance profile per 100 nm in the longitudinal direction of the gray scale image is 50 or more.
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