Invention Grant
- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
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Application No.: US17169757Application Date: 2021-02-08
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Publication No.: US12001140B2Publication Date: 2024-06-04
- Inventor: Kazunari Yagi , Akihiro Kaneko , Takashi Kawashima , Akiyoshi Goto
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP 18168170 2018.09.07 JP 19030587 2019.02.22
- Main IPC: G03F7/039
- IPC: G03F7/039 ; C08F212/14 ; C08F220/18 ; C08F220/58 ; G03F7/038

Abstract:
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a polarity that increases by the action of an acid; and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the resin has a repeating unit represented by General Formula (B-1).
Public/Granted literature
Information query
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