Invention Grant
- Patent Title: Flow rate control device
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Application No.: US18079872Application Date: 2022-12-12
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Publication No.: US12001231B2Publication Date: 2024-06-04
- Inventor: Fumikazu Tamura , Shinji Tobimatsu , Masatoshi Nakamura , Kenji Yamamoto
- Applicant: TOFLO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TOFLO CORPORATION
- Current Assignee: TOFLO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Bridgeway IP Law Group, PLLC
- Agent Sang Hoe Lee; Hyun Woo Shin
- Priority: JP 22080423 2022.05.16
- Main IPC: G05D7/06
- IPC: G05D7/06

Abstract:
A flow rate control device capable of suppressing overshoot while improving responsiveness at the beginning of flow rate control includes: a flow rate meter that measures a flow rate of a fluid flowing through a flow path; a flow rate regulating valve that regulates the flow rate of the fluid flowing through the flow path; and a control part that controls an opening degree of the flow rate regulating valve based on a measurement result of the flow rate meter, the flow rate control device has: a low flow rate rapid valve opening function that accelerates an outflow of the fluid by forcibly opening the opening degree of the flow rate regulating valve from fully closed degree to a designated opening degree when the opening degree of the flow regulating valve is fully closed and a flow rate control is started; and an overshoot suppressing function that is used for suppressing the overshoot by making the flow rate control stand by until a preset standby time or a preset flow rate threshold is reached immediately after the low flow rate rapid valve opening function works.
Public/Granted literature
- US20230367338A1 Flow Rate Control Device Public/Granted day:2023-11-16
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