Invention Grant
- Patent Title: Writing method and erasing method of fusion memory
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Application No.: US17426053Application Date: 2019-01-28
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Publication No.: US12002500B2Publication Date: 2024-06-04
- Inventor: Hangbing Lv , Qing Luo , Xiaoxin Xu , Tiancheng Gong , Ming Liu
- Applicant: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES
- Applicant Address: CN Beijing
- Assignee: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES
- Current Assignee: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES
- Current Assignee Address: CN Beijing
- Agency: Christensen, Fonder, Dardi & Herbert PLLC
- International Application: PCT/CN2019/073435 2019.01.28
- International Announcement: WO2020/154844A 2020.08.06
- Date entered country: 2021-07-27
- Main IPC: G11C11/22
- IPC: G11C11/22 ; G11C16/14 ; G11C16/34

Abstract:
A writing method and erasing method of a fusion memory are provided, and the fusion memory includes a plurality of memory cells, and each memory cell of the plurality of memory cells includes a bulk substrate; a source and a drain on the bulk substrate, a channel region extending between the source and the drain, and a ferroelectric layer and a gate stacked on the channel region; and the writing method includes: applying a first voltage between the gate of at least one memory cell and the bulk of at least one memory cell, in which the first voltage is less than a reversal voltage at which the ferroelectric layer is polarization reversed, and each of the source and the drain is grounded or in a floating state.
Public/Granted literature
- US20220115052A1 WRITING METHOD AND ERASING METHOD OF FUSION MEMORY Public/Granted day:2022-04-14
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