Invention Grant
- Patent Title: Semiconductor device with bonded substrates
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Application No.: US17461550Application Date: 2021-08-30
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Publication No.: US12002777B2Publication Date: 2024-06-04
- Inventor: Kotaro Fujii , Shinya Watanabe
- Applicant: KIOXIA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: JP 21042893 2021.03.16
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L25/00 ; H01L25/065 ; H01L25/18

Abstract:
According to one or more embodiments, a semiconductor device includes a first substrate and a second substrate. The first substrate includes a first metal layer and a first insulating layer. The first insulating layer surrounds the first metal layer. The second substrate includes a second metal layer, a second insulating layer, and a first conducive body. The second metal layer is in contact with the first metal layer. The second insulating layer surrounds the second metal layer and is in contact with the first insulating layer. A part of the first conductive body is in the second metal layer and extends in a first direction toward the first metal layer.
Public/Granted literature
- US20220302055A1 SEMICONDUCTOR DEVICE Public/Granted day:2022-09-22
Information query
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