Invention Grant
- Patent Title: Array substrate and manufacturing method thereof
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Application No.: US17057629Application Date: 2020-10-20
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Publication No.: US12002814B2Publication Date: 2024-06-04
- Inventor: Xu Huang
- Applicant: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Shenzhen
- Assignee: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Shenzhen
- Agency: PV IP PC
- Agent Wei Te Chung; Zhigang Ma
- Priority: CN 2010919303.9 2020.09.04
- International Application: PCT/CN2020/122229 2020.10.20
- International Announcement: WO2022/047908A 2022.03.10
- Date entered country: 2020-11-20
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H10K59/12

Abstract:
The present application provides an array substrate and a manufacturing method thereof. The array substrate includes a substrate; an active layer comprising a channel region; a gate insulating layer; a gate corresponding to the channel region of the active layer; and a source and a drain disposed at opposite ends of the active layer, wherein the gate has a groove structure, the groove structure has an opening facing the active layer, and a region of the groove structure corresponding to the active layer is the channel region.
Public/Granted literature
- US20220310665A1 ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF Public/Granted day:2022-09-29
Information query
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