Invention Grant
- Patent Title: Vertical type transistor, inverter including the same, and vertical type semiconductor device including the same
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Application No.: US18157478Application Date: 2023-01-20
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Publication No.: US12002882B2Publication Date: 2024-06-04
- Inventor: Minhyun Lee , Minsu Seol , Yeonchoo Cho , Hyeonjin Shin
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR 20200032276 2020.03.16 KR 20200175834 2020.12.15
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L27/092 ; H01L29/24 ; H01L29/417 ; H01L29/78 ; H01L29/786

Abstract:
A vertical type transistor includes: a substrate; a first source/drain electrode layer provided on the substrate; a second source/drain electrode layer provided above the first source/drain electrode layer; a first gate electrode layer provided between the first and second source/drain electrode layers; a first gate insulating film passing through the first gate electrode layer; a hole passing through the second source/drain electrode layer, the first gate insulating film, and the first source/drain electrode layer; and a first channel layer provided on a lateral side of the hole, wherein the first channel layer may include a 2D semiconductor.
Public/Granted literature
Information query
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