Invention Grant
- Patent Title: Semiconductor device with embedded Schottky diode and manufacturing method thereof
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Application No.: US17929766Application Date: 2022-09-06
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Publication No.: US12002892B2Publication Date: 2024-06-04
- Inventor: Wing Kit Cheung , Wai Tien Chan , Wing Chong Tony Chau , Ho Nam Lee , Qian Sun
- Applicant: Alpha Power Solutions Limited
- Applicant Address: CN Hong Kong
- Assignee: Alpha Power Solutions Limited
- Current Assignee: Alpha Power Solutions Limited
- Current Assignee Address: CN Hong Kong
- Agency: S&F/WEHRW
- The original application number of the division: US16947556 2020.08.06
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L21/28 ; H01L29/06 ; H01L29/16 ; H01L29/78 ; H01L29/872

Abstract:
One embodiment provides a semiconductor device. The device comprises a substrate having a first face and a second face, a well region, a source region disposed in the well region, a contact region contacting the well region and the source region, a Schottky region, and a source metal layer. A first part of the source metal layer contacts the Schottky region to form a Schottky diode. The Schottky region is surrounded by the contact region and the well region in a first plane perpendicular to a direction from the first face toward the second face.
Public/Granted literature
- US20220416093A1 SEMICONDUCTOR DEVICE WITH EMBEDDED SCHOTTKY DIODE AND MANUFACTURING METHOD THEREOF Public/Granted day:2022-12-29
Information query
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