Invention Grant
- Patent Title: Semiconductor device and method of manufacturing the same
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Application No.: US17643277Application Date: 2021-12-08
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Publication No.: US12004339B2Publication Date: 2024-06-04
- Inventor: Keisuke Nakatsuka , Takuya Ohoka
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP 21131344 2021.08.11
- Main IPC: H10B12/00
- IPC: H10B12/00

Abstract:
In one embodiment, a semiconductor device includes a substrate, transistors on the substrate, and a stacked film provided above the transistors, including electrode layers separated from each other in a first direction, and including first, second and third regions. The device further includes plugs provided to the electrode layers in the first region, a first columnar portion in the second region, and a second columnar portion in the third region. At least one electrode layer among the electrode layers includes a first portion in the first region, a second portion in the second region, and a third portion in the third region, and is a continuous film from the second portion to the third portion via the first portion. The transistors include first, second and third transistors provided right under the first, second and third regions and electrically connected to first, second and third plugs among the plugs, respectively.
Public/Granted literature
- US20230051013A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2023-02-16
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