Invention Grant
- Patent Title: Method for manufacturing device
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Application No.: US16972518Application Date: 2019-09-18
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Publication No.: US12004414B2Publication Date: 2024-06-04
- Inventor: Yongnam Kim , Jong Seok Kim , Yun Hye Hahm , Seiyong Kim
- Applicant: LG CHEM, LTD.
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: Bryan Cave Leighton Paisner LLP
- Priority: KR 20180111490 2018.09.18
- International Application: PCT/KR2019/012036 2019.09.18
- International Announcement: WO2020/060173A 2020.03.26
- Date entered country: 2020-12-04
- Main IPC: H01L51/00
- IPC: H01L51/00 ; H01L31/0224 ; H01L31/18 ; H10K30/82 ; H10K71/50 ; H10K85/00

Abstract:
A method for manufacturing a device, the method including: preparing a first laminate including a first buffer layer and a second buffer layer; preparing a second laminate including a third buffer layer provided on a carbon electrode; and attaching the first laminate to the second laminate so that the second buffer layer is in contact with the third buffer layer.
Public/Granted literature
- US20210273170A1 METHOD FOR MANUFACTURING DEVICE Public/Granted day:2021-09-02
Information query
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