Invention Grant
- Patent Title: Patterned apertured nonwoven
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Application No.: US17510700Application Date: 2021-10-26
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Publication No.: US12004933B2Publication Date: 2024-06-11
- Inventor: Sijia Wang , Fancheng Wang , Yuhan Wang , Meng Chen , Xiaoxin Liu
- Applicant: The Procter & Gamble Company
- Applicant Address: US OH Cincinnati
- Assignee: The Procter & Gamble Company
- Current Assignee: The Procter & Gamble Company
- Current Assignee Address: US OH Cincinnati
- Agent Sarah M. DeCristofaro
- Priority: WO TCN2020125247 2020.10.30
- Main IPC: A61F13/15
- IPC: A61F13/15 ; A61F13/514

Abstract:
The present disclosure relates to a nonwoven substrate comprising a plurality of apertures that form a pattern and define a plurality of discrete non-aperture zones. Each of the plurality of discrete non-aperture zones has a periphery formed by a continuous line of apertures, with adjacent apertures being spaced apart by an edge-to-edge distance of no more than 3 mm, while each of the plurality of discrete non-aperture zones is substantially free of apertures within the periphery. Particularly, the area ratio of such plurality of discrete non-aperture zones over the nonwoven substrate ranges from 60% to 90%, and at least some of said plurality of discrete non-aperture zones have an area of 100 mm2 or more.
Public/Granted literature
- US20220133551A1 Patterned Apertured Nonwoven Public/Granted day:2022-05-05
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