Invention Grant
- Patent Title: Vapor deposition device
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Application No.: US17596571Application Date: 2020-03-18
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Publication No.: US12006568B2Publication Date: 2024-06-11
- Inventor: Kazuhide Matsumoto , Hsin-Tsai Wang
- Applicant: THERMALYTICA, INC.
- Applicant Address: JP Tsukuba
- Assignee: THERMALYTICA, INC.
- Current Assignee: THERMALYTICA, INC.
- Current Assignee Address: JP Tsukuba
- Agency: Potomac Law Group, PLLC
- International Application: PCT/JP2020/011904 2020.03.18
- International Announcement: WO2021/186604A 2021.09.23
- Date entered country: 2021-12-13
- Main IPC: C23C14/50
- IPC: C23C14/50 ; C23C14/35 ; C23C14/56

Abstract:
A vapor deposition device for forming a ceramic coating on a substrate, the device including a coating chamber, loading chambers, substrate support mechanisms, horizontal moving mechanisms, and reversing mechanisms, and configured as follows. The coating chamber and each loading chambers are connected individually to a vacuumizer and are connected to each other at their openings. In the coating chamber, an electron gun is provided that emits an electron beam with which the held ceramic raw material is irradiated. Each of the substrate support mechanisms includes left and right partition walls, a left substrate support plate on the left side of the left partition wall, and a right substrate support plate on the right side of the right partition wall. Each of the substrate support plates has multiple substrate mounting portions for mounting substrates thereon. The left and right substrate support plates are capable of revolving in a plane parallel to the left and right partition walls, and each of the multiple substrate mounting portions is capable of rotating. Each of the horizontal moving mechanisms is configured to cause the substrate support mechanism to move horizontally in the left-right direction between a vapor deposition position where one of the partition walls is in close contact with the opening and a reverse position where the left and right sides of the substrate support mechanism are reversed.
Public/Granted literature
- US20220228254A1 VAPOR DEPOSITION DEVICE Public/Granted day:2022-07-21
Information query
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