Invention Grant
- Patent Title: Monitoring system
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Application No.: US17277836Application Date: 2019-10-01
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Publication No.: US12006632B2Publication Date: 2024-06-11
- Inventor: Hiroshi Sekiya , Hitomaru Sakata , Daisuke Kobayashi , Ayano Suga
- Applicant: MAINTECH CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: MAINTECH CO., LTD.
- Current Assignee: MAINTECH CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: JP 18186934 2018.10.01
- International Application: PCT/JP2019/038764 2019.10.01
- International Announcement: WO2020/071370A 2020.04.09
- Date entered country: 2021-03-19
- Main IPC: D21G9/00
- IPC: D21G9/00 ; G01N21/892 ; G05B15/02 ; H04N7/18 ; D21F1/32 ; G01N21/84

Abstract:
An object is to provide a monitoring system capable of preventing the occurrence of a defect in paper by monitoring the device. The present invention is directed to a monitoring system A having a papermaking machine 1 for manufacturing paper X, an applying device 2 for applying a chemical solution to a site of the papermaking machine directly or indirectly in contact with the paper while the papermaking machine 1 is operated, a control panel 3 for setting an application condition of the applying device 2, a monitoring camera 4 for monitoring a monitoring target site, and a control device 5 connected to the monitoring camera 4 via a network. The monitoring target site is the site of the papermaking machine 1 directly or indirectly in contact with the paper X and/or the applying device 2, and the control device 5 has a computing unit S1 which converts a state of the monitoring target site into a numerical form by using video taken by the monitoring camera 4, a display unit S2 which displays detection data obtained by conversion into the numerical form at the computing unit S1, and a storage unit S3 which stores the detection data.
Public/Granted literature
- US20210348334A1 MONITORING SYSTEM Public/Granted day:2021-11-11
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