Invention Grant
- Patent Title: System for coupling RF power into LINACs and bellows coating by magnetron sputtering with kick pulse
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Application No.: US17322600Application Date: 2021-05-17
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Publication No.: US12009192B2Publication Date: 2024-06-11
- Inventor: Thomas J. Houlahan, Jr. , Daniel P. Menet , Ian F. Haehnlein , Ivan A. Shchelkanov , Robert A. Stubbers , Brian E. Jurczyk
- Applicant: Starfire Industries LLC
- Applicant Address: US IL Champaign
- Assignee: Starfire Industries LLC
- Current Assignee: Starfire Industries LLC
- Current Assignee Address: US IL Champaign
- Agency: Leydig, Voit & Mayer, Ltd.
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C23C14/34 ; C23C14/35

Abstract:
A system and associated method are described for depositing high-quality films for providing a coating on a three-dimensional surface such as an internal surface of a bellows structure. The system includes a magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target. The system further includes an elongated sputtering electrode material tube surrounding the magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along the sputter target. During operation, the system generates and controls ion flux for direct current high-power impulse magnetron sputtering. During operation logic circuitry issues a control signal to control a kick pulse property of a sustained positive voltage kick pulse taken from the group consisting of: onset delay, amplitude and duration.
Public/Granted literature
- US20210327694A1 SYSTEM FOR COUPLING RF POWER INTO LINACS AND BELLOWS COATING BY MAGNETRON SPUTTERING WITH KICK PULSE Public/Granted day:2021-10-21
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