Invention Grant
- Patent Title: Dual-cure phase-separation type photosensitive resin composition for continuous 3D printing with high precision
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Application No.: US17433946Application Date: 2020-11-04
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Publication No.: US12013638B2Publication Date: 2024-06-18
- Inventor: Wenbin Wang , Jie Xiong
- Applicant: SUZHOU POLLY NEW MATERIAL TECH CO., LTD.
- Applicant Address: CN Jiangsu
- Assignee: SUZHOU POLLY NEW MATERIAL TECH CO., LTD.
- Current Assignee: SUZHOU POLLY NEW MATERIAL TECH CO., LTD.
- Current Assignee Address: CN Jiangsu
- Agency: HSML P.C.
- Priority: CN 2010356325.9 2020.04.29
- International Application: PCT/CN2020/126356 2020.11.04
- International Announcement: WO2021/218097A 2021.11.04
- Date entered country: 2021-08-25
- Main IPC: G03F7/035
- IPC: G03F7/035 ; G03F7/027 ; G03F7/031 ; G03F7/038 ; B33Y10/00 ; B33Y70/00

Abstract:
The present disclosure relates to a dual-cure phase-separation type photosensitive resin composition for continuous 3D printing with high precision, including an acrylate having a cross-linkable double bond, a polyurethane prepolymer, a chain extender, and a photoinitiator. The polyurethane prepolymer is produced by a reaction between an isocyanate and a polyether polyol with a molecular weight larger than or equal to 4000 under heating and catalytic action. The photosensitive resin composition of the present disclosure is used in the continuous 3D printing to make high precision parts.
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