Invention Grant
- Patent Title: Vertical cavity surface emitting laser and corresponding fabricating method
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Application No.: US17338155Application Date: 2021-06-03
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Publication No.: US12015246B2Publication Date: 2024-06-18
- Inventor: Qian Fan , Xianfeng Ni , Bin Hua , Ying Cui
- Applicant: SUZHOU HANHUA SEMICONDUCTOR CO., LTD.
- Applicant Address: CN Jiangsu
- Assignee: SUZHOU HANHUA SEMICONDUCTOR CO., LTD.
- Current Assignee: SUZHOU HANHUA SEMICONDUCTOR CO., LTD.
- Current Assignee Address: CN Jiangsu
- Agency: WHDA, LLP
- Priority: CN 2010499463.2 2020.06.05
- Main IPC: H01S5/183
- IPC: H01S5/183 ; H01S5/042 ; H01S5/20

Abstract:
A method of fabricating vertical cavity surface emitting laser, comprising: providing a first substrate formed with a dielectric DBR and a first bonding layer, and a second substrate formed with a etch-stop layer, a heavily doped layer, an active region, a current-confinement layer, and an arsenide DBR firstly, then sticking a third substrate on the arsenide DBR, then removing the second substrate and the etch-stop layer, next bonding the heavily doped layer to the dielectric DBR, next removing the third substrate, finally forming a p-type electrode contact and an n-type electrode contact.
Public/Granted literature
- US20210384705A1 VERTICAL CAVITY SURFACE EMITTING LASER AND CORRESPONDING FABRICATING METHOD Public/Granted day:2021-12-09
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