Invention Grant
- Patent Title: Semiconductor wafer, radiation detection element, radiation detector, and production method for compound semiconductor monocrystalline substrate
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Application No.: US17439307Application Date: 2019-12-05
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Publication No.: US12021160B2Publication Date: 2024-06-25
- Inventor: Koji Murakami , Akira Noda , Ryuichi Hirano
- Applicant: JX METALS CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JX METALS CORPORATION
- Current Assignee: JX METALS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP 19094051 2019.05.17
- International Application: PCT/JP2019/047672 2019.12.05
- International Announcement: WO2020/235124A 2020.11.26
- Date entered country: 2021-09-14
- Main IPC: H01L31/0296
- IPC: H01L31/0296 ; C30B11/02 ; C30B29/48 ; C30B33/02 ; G01T1/24 ; H01L27/144

Abstract:
Provided is a CdZnTe monocrystalline substrate which has a small leakage current even when a voltage is applied from a low voltage to a high voltage, and which has a lower variation in resistivity with respect to applied voltage changes from 0 to 900 V, and which can maintain a stable resistivity. A semiconductor wafer comprising a cadmium zinc telluride monocrystal having a zinc concentration of 4.0 at % or more and 6.5 at % or less and a chlorine concentration of 0.1 ppm by weight or more and 5.0 ppm by weight or less, wherein when a voltage is applied in a range of from 0 to 900 V, the semiconductor wafer has a resistivity for each applied voltage value of 1.0×107 Ωcm or more and 7.0×108 Ωcm or less, and wherein a relative variation coefficient of each resistivity to the applied voltages in a range of from 0 to 900 V is 100% or less.
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