Invention Grant
- Patent Title: Post-chemical mechanical polishing brush cleaning box
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Application No.: US17375961Application Date: 2021-07-14
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Publication No.: US12023779B2Publication Date: 2024-07-02
- Inventor: Gary Ka Ho Lam
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: B24B37/34
- IPC: B24B37/34 ; A46B13/00 ; A46B13/02

Abstract:
Embodiments provided herein include a system and method for cleaning a first surface of a substrate using a brush carousel assembly. In one embodiment, the brush carousel assembly includes one or more rotatable brush mounting assemblies coupled to a rotatable carriage, having a carriage support structure configured to rotate about a carriage axis. The brush carousel assembly further includes a second brush mounting assembly disposed a second radial distance from the carriage axis, and coupled to the support structure of the carriage that includes the one or more rotatable support members.
Public/Granted literature
- US20230013401A1 POST-CHEMICAL MECHANICAL POLISHING BRUSH CLEANING BOX Public/Granted day:2023-01-19
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