Invention Grant
- Patent Title: Position detection apparatus, imprint apparatus, and article manufacturing method
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Application No.: US17859366Application Date: 2022-07-07
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Publication No.: US12023850B2Publication Date: 2024-07-02
- Inventor: Tomokazu Taki , Takafumi Miyaharu
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: ROSSI, KIMMS & McDOWELL LLP
- Priority: JP 21123566 2021.07.28
- Main IPC: B29C59/00
- IPC: B29C59/00 ; B29C59/02 ; B29C37/00

Abstract:
A position detection apparatus comprises an obtaining unit that obtains an image of a moiré that occurs due to first and second diffraction gratings overlapping; and a processor configured to perform a periodic analysis of a luminance distribution of the obtained image of the moiré, obtain a phase measurement value of the luminance distribution, and obtain a relative positioning between the first and second diffraction gratings, wherein the processor determines a phase shift amount for making the obtained phase measurement value be a value outside of a predetermined range including a discontinuous part of the phase, and performs a phase shift to shift the obtained phase measurement value by the determined phase shift amount, and obtains the relative positioning based on the phase-shifted phase measurement value.
Public/Granted literature
- US20230031701A1 POSITION DETECTION APPARATUS, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD Public/Granted day:2023-02-02
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