Invention Grant
- Patent Title: Droplet ejection apparatus and droplet ejection method using the same
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Application No.: US17632031Application Date: 2020-12-09
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Publication No.: US12023923B2Publication Date: 2024-07-02
- Inventor: Shin Hur , Duck Gyu Lee , Bo-Yeon Lee
- Applicant: Korea Institute of Machinery & Materials
- Applicant Address: KR Daejeon
- Assignee: Korea Institute of Machinery & Materials
- Current Assignee: Korea Institute of Machinery & Materials
- Current Assignee Address: KR Daejeon
- Agency: HARNESS, DICKEY & PIERCE, P.L.C.
- Priority: KR 20190171632 2019.12.20
- International Application: PCT/KR2020/017987 2020.12.09
- International Announcement: WO2021/125687A 2021.06.24
- Date entered country: 2022-02-01
- Main IPC: B41J2/14
- IPC: B41J2/14 ; B41J2/04
Abstract:
In a droplet ejection apparatus and a droplet ejection method using the droplet ejection apparatus, the droplet ejection apparatus includes a liquid supply unit, a nozzle and a standing wave generating unit. The liquid supply unit is configured to provide a pressure to a liquid. The nozzle is connected to the liquid supply unit through a connecting conduit, to eject the liquid with a droplet. The standing wave generating unit is configured to generate a standing wave around the nozzle at which the droplet is formed, to detach the droplet from the nozzle.
Public/Granted literature
- US20220274403A1 DROPLET EJECTION APPARATUS AND DROPLET EJECTION METHOD USING THE SAME Public/Granted day:2022-09-01
Information query
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