Invention Grant
- Patent Title: Method for continuously generating silicon monoxide gas
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Application No.: US17563129Application Date: 2021-12-28
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Publication No.: US12024437B2Publication Date: 2024-07-02
- Inventor: Yusuke Kashitani
- Applicant: OSAKA Titanium technologies Co., Ltd.
- Applicant Address: JP Hyogo
- Assignee: OSAKA Titanium technologies Co., Ltd.
- Current Assignee: OSAKA Titanium technologies Co., Ltd.
- Current Assignee Address: JP Hyogo
- Agency: Clark & Brody LP
- Main IPC: C01B33/113
- IPC: C01B33/113

Abstract:
In a method for continuously generating silicon monoxide (SiO) gas, wherein a silicon monoxide gas-generating raw material in a raw material supply unit is continuously charged into a reaction chamber RM, an inert gas is flowed through the raw material supply unit so as to be directed toward the charging direction of the silicon monoxide gas-generating raw material. The method for continuously generating silicon monoxide gas prevents a decrease in yield of the silicon monoxide (SiO) gas-generating raw material.
Public/Granted literature
- US20230202848A1 METHOD FOR CONTINUOUSLY GENERATING SILICON MONOXIDE GAS Public/Granted day:2023-06-29
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