Invention Grant
- Patent Title: Apparatus and method for inspecting semiconductor
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Application No.: US17853079Application Date: 2022-06-29
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Publication No.: US12025652B2Publication Date: 2024-07-02
- Inventor: Mi-Sol Youn , Min Kim , Kyoung Woon Min
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR 20210105879 2021.08.11
- Main IPC: G01R31/28
- IPC: G01R31/28

Abstract:
An apparatus and a method for inspecting a semiconductor includes a water tank which includes a housing, an interior of which is filled with a liquid, and a support block which provides a settling surface for an inspection object inside the housing. A plurality of signal generators are installed on a bottom surface of the housing, and output a frequency signal in a direction in which the inspection object is located. A power supply operates the signal generators. A probe is placed above the inspection object, and a receiver which operates with the probe and is attached to a bottom surface of the support block. Foreign matter remaining on the inspection object are removed, using a plurality of frequency signals which are output by the plurality of signal generating units.
Public/Granted literature
- US20230048997A1 APPARATUS AND METHOD FOR INSPECTING SEMICONDUCTOR Public/Granted day:2023-02-16
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