Invention Grant
- Patent Title: Method and system for wafer-level testing
-
Application No.: US18301274Application Date: 2023-04-17
-
Publication No.: US12025655B2Publication Date: 2024-07-02
- Inventor: Jun He , Yu-Ting Lin , Wei-Hsun Lin , Yung-Liang Kuo , Yinlung Lu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT LAW
- Agent Anthony King
- Main IPC: G01R31/28
- IPC: G01R31/28

Abstract:
The present disclosure provides a method and a system for testing semiconductor device. The method includes the following operations. A wafer having an IC formed thereon is provided. The IC is energized by raising the voltage of the IC to a first voltage level during a first period. A stress signal is applied to the IC. The stress signal includes a plurality of sequences during a second period subsequent to the first period. Each of the sequence has a ramp-up stage and a ramp-down stage. The stress signal causes the voltage of the IC to fluctuate between a second voltage level and a third voltage level. Whether the IC complies with a test criterion is determined after applying the stress signal.
Public/Granted literature
- US20230251306A1 METHOD AND SYSTEM FOR WAFER-LEVEL TESTING Public/Granted day:2023-08-10
Information query