Invention Grant
- Patent Title: Lithography system and operation method thereof
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Application No.: US18151163Application Date: 2023-01-06
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Publication No.: US12025923B2Publication Date: 2024-07-02
- Inventor: Chi-Hung Liao , Min-Cheng Wu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: G03F7/00
- IPC: G03F7/00 ; H05G2/00

Abstract:
A method includes shooting a primary droplet and a satellite droplet from a droplet generator along a common initial direction; applying a force to the primary droplet and the satellite droplet, wherein after applying the force, the primary droplet has a first deflection toward a first direction different than the common initial direction, and the satellite droplet has a second deflection toward a second direction different than the common initial direction, wherein the second deflection of the satellite droplet is greater than the first deflection of the primary droplet; and generating an extreme ultraviolet (EUV) light using an excitation laser hitting the primary droplet with the first deflection.
Public/Granted literature
- US20230161273A1 LITHOGRAPHY SYSTEM AND OPERATION METHOD THEREOF Public/Granted day:2023-05-25
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