- Patent Title: Method of determining set of sample shot regions, method of obtaining measurement value, information processing apparatus, lithography apparatus, storage medium, and article manufacturing method
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Application No.: US17463769Application Date: 2021-09-01
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Publication No.: US12025924B2Publication Date: 2024-07-02
- Inventor: Shinichi Egashira
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: ROSSI, KIMMS & McDOWELL LLP
- Priority: JP 20161328 2020.09.25
- Main IPC: G03F9/00
- IPC: G03F9/00 ; H01L21/66

Abstract:
Provided is a method of determining, out of a plurality of shot regions of a substrate, a set of sample shot regions in each of which a position of a mark is to be actually measured. The method includes setting an initial arrangement of the set of sample shot regions, and adding, to the set of sample shot regions, a shot region, among the shot regions other than the sample shot regions in the initial arrangement, in which a value indicating uncertainty of an estimate of a measurement value of a position of a mark obtained using an estimation model exceeds a predetermined threshold value.
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