- Patent Title: Semiconductor memory devices and methods of fabricating the same
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Application No.: US17538064Application Date: 2021-11-30
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Publication No.: US12029024B2Publication Date: 2024-07-02
- Inventor: Deokhan Bae , Juhun Park , Yuri Lee , Yoonyoung Jung , Sooyeon Hong
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel, P.A.
- Priority: KR 20210043961 2021.04.05 KR 20210069543 2021.05.28
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/06 ; H01L29/417 ; H01L29/423 ; H01L29/78 ; H01L29/786 ; H10B10/00

Abstract:
A semiconductor memory device includes an active pattern on a substrate, the active pattern including a source/drain pattern in an upper portion thereof, a gate electrode on the active pattern and extended in a first direction, the gate electrode and the source/drain pattern adjacent to each other in a second direction that crosses the first direction, and a shared contact coupled to the source/drain pattern and the gate electrode to electrically connect the source/drain pattern and the gate electrode. The shared contact includes active and gate contacts, which are electrically connected to the source/drain pattern and the gate electrode, respectively. The gate contact includes a body portion coupled to the gate electrode and a protruding portion, which protrudes from the body portion in the second direction and extends into and buried in the active contact.
Public/Granted literature
- US20220320115A1 SEMICONDUCTOR MEMORY DEVICES AND METHODS OF FABRICATING THE SAME Public/Granted day:2022-10-06
Information query
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