Invention Grant
- Patent Title: Resistive memory device
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Application No.: US17526262Application Date: 2021-11-15
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Publication No.: US12029048B2Publication Date: 2024-07-02
- Inventor: Hyunmog Park , Jungyu Lee , Daehwan Kang , Sungho Eun
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Muir Patent Law, PLLC
- Priority: KR 20210038277 2021.03.24
- Main IPC: H10B63/00
- IPC: H10B63/00 ; G11C13/00 ; H10N70/00

Abstract:
A resistive memory device includes: memory cells overlapping one another in a vertical direction within a cell array region and each including a switching element and a variable resistive element; first conductive lines each being connected to the switching element; a second conductive line connected to the variable resistive element and conductive pads arranged in a connection region and connected to respective one ends of the first conductive lines, respectively, and having different lengths in the second horizontal direction. A lower conductive pad from among the conductive pads includes a first portion covered by an upper conductive pad, and a second portion not covered by the upper conductive pad, and a thickness of each of the first and second portions in the vertical direction is greater than a thickness of each of the first conductive lines in the vertical direction.
Public/Granted literature
- US20220310698A1 RESISTIVE MEMORY DEVICE Public/Granted day:2022-09-29
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