Invention Grant
- Patent Title: Chemical liquid and chemical liquid storage body
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Application No.: US17139045Application Date: 2020-12-31
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Publication No.: US12030713B2Publication Date: 2024-07-09
- Inventor: Tetsuya Kamimura , Satomi Takahashi , Tadashi Oomatsu , Tetsuya Shimizu
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP 18131747 2018.07.11
- Main IPC: G03F7/32
- IPC: G03F7/32 ; B65D25/14 ; B65D81/26 ; B65D85/00 ; G03F7/00

Abstract:
The present invention provides a chemical liquid having excellent defect suppressing properties. The present invention further provides a chemical liquid storage body containing the chemical liquid. The chemical liquid of the present invention is a chemical liquid containing a compound other than an alkane and an alkene, and one or more organic solvents selected from the group consisting of decane and undecane, in which the chemical liquid further contains one or more organic components selected from the group consisting of alkanes having 12 to 50 carbon atoms and alkenes having 12 to 50 carbon atoms, and a content of the organic component is 0.10 to 1,000,000 mass ppt with respect to a total mass of the chemical liquid.
Public/Granted literature
- US20210139231A1 CHEMICAL LIQUID AND CHEMICAL LIQUID STORAGE BODY Public/Granted day:2021-05-13
Information query
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