Invention Grant
- Patent Title: Compound and composition
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Application No.: US17605705Application Date: 2020-05-28
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Publication No.: US12030844B2Publication Date: 2024-07-09
- Inventor: Shogo Kamenoue , Takashi Mizooku , Ryuya Arata , Akiyoshi Kimura
- Applicant: KAO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: KAO CORPORATION
- Current Assignee: KAO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP 19099445 2019.05.28
- International Application: PCT/JP2020/021174 2020.05.28
- International Announcement: WO2020/241771A 2020.12.03
- Date entered country: 2021-10-22
- Main IPC: C07C43/13
- IPC: C07C43/13 ; C07D303/14
Abstract:
The present invention provides: a compound that has a low melting point and is capable of forming a film of high hydrophobicity, and a composition containing this compound. The compound of the present invention is represented by chemical formula (1).
(In the formula, R1 and R2 are each a C1-C33 aliphatic hydrocarbon group, the total number of carbons of in R1 and R2 is 14-34, X is a single bond or a C1-C5 aliphatic hydrocarbon group, and A is —O—CH2—CH(OH)—CH2OH or —O—CH(—CH2—OH)2).
(In the formula, R1 and R2 are each a C1-C33 aliphatic hydrocarbon group, the total number of carbons of in R1 and R2 is 14-34, X is a single bond or a C1-C5 aliphatic hydrocarbon group, and A is —O—CH2—CH(OH)—CH2OH or —O—CH(—CH2—OH)2).
Public/Granted literature
- US20220144741A1 COMPOUND AND COMPOSITION Public/Granted day:2022-05-12
Information query
