Invention Grant
- Patent Title: Image sensor and method of manufacturing the same
-
Application No.: US17465217Application Date: 2021-09-02
-
Publication No.: US12034026B2Publication Date: 2024-07-09
- Inventor: Hyuncheol Kim , Kyungho Lee , Kazunori Kakehi , Doosik Seol , Kyungduck Lee , Taesub Jung , Masato Fujita
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Muir Patent Law, PLLC
- Priority: KR 20200176126 2020.12.16
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
An image sensor includes a substrate having first and second surfaces, pixel regions arranged in a direction parallel to the first surface, first and second photodiodes isolated from each other in each of the pixel regions, a first device isolation film between the pixel regions, a pair of second device isolation films between the first and second photodiodes and extending from the first device isolation film, a doped layer adjacent to the pair of second device isolation films and extending from the second surface to a predetermined depth and spaced apart from the first surface, the doped layer being isolated from the first device isolation film, and a barrier area between the pair of second device isolation films and having a potential greater than a potential of a portion of the substrate adjacent to the barrier area.
Public/Granted literature
- US20220190007A1 IMAGE SENSOR AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2022-06-16
Information query
IPC分类: