Invention Grant
- Patent Title: Methods for enlarging the memory window and improving data retention in resistive memory device
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Application No.: US18312635Application Date: 2023-05-05
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Publication No.: US12040019B2Publication Date: 2024-07-16
- Inventor: Fu-Chen Chang , Chu-Jie Huang , Nai-Chao Su , Kuo-Chi Tu , Wen-Ting Chu
- Applicant: Taiwan Semiconductor Manufacturing Company Limited
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee Address: TW Hsinchu
- Agency: The Marbury Law Group, PLLC
- Main IPC: G11C11/00
- IPC: G11C11/00 ; G11C13/00 ; H10N70/00 ; H10N70/20

Abstract:
Methods for programming memory cells of a resistive memory device include applying a voltage pulse sequence to a memory cell to set a logic state of the memory cell. An initial set sequence of voltage pulses may be applied to the memory cell, followed by a reform voltage pulse having an amplitude greater than the amplitudes of the initial set sequence, and within ±5% of the amplitude of a voltage pulse used in an initial forming process. Additional voltage pulses having amplitudes that are less than the amplitude of the reform voltage pulse may be subsequently applied. By applying a reform voltage pulse in the middle of, or at the end of, a memory set sequence including multiple voltage pulses, a resistive memory device may have a larger memory window and improved data retention relative to resistive memory devices programmed using conventional programming methods.
Public/Granted literature
- US20230274780A1 METHODS FOR ENLARGING THE MEMORY WINDOW AND IMPROVING DATA RETENTION IN RESTISTIVE MEMORY DEVICE Public/Granted day:2023-08-31
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