- Patent Title: Nitride semiconductor device and method for manufacturing the same
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Application No.: US17418839Application Date: 2021-03-05
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Publication No.: US12040244B2Publication Date: 2024-07-16
- Inventor: Kai Cao , Lei Zhang , Yifeng Zhu , King Yuen Wong , Chunhua Zhou
- Applicant: INNOSCIENCE (SUZHOU) TECHNOLOGY CO., LTD.
- Applicant Address: CN Suzhou
- Assignee: INNOSCIENCE (SUZHOU) TECHNOLOGY CO., LTD.
- Current Assignee: INNOSCIENCE (SUZHOU) TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Suzhou
- Agency: JCIPRNET
- International Application: PCT/CN2021/079411 2021.03.05
- International Announcement: WO2022/183512A 2022.09.09
- Date entered country: 2021-06-27
- Main IPC: H01L23/29
- IPC: H01L23/29 ; H01L23/14

Abstract:
A nitride semiconductor device includes a semiconductor carrier, a first nitride-based chip, and first conformal connecting structures. The first nitride-based chip is disposed over the semiconductor carrier. The semiconductor carrier has a first planar surface. The first nitride-based chip has a second planar surface, first conductive pads, and first slanted surfaces. The first conductive pads are disposed in the second planar surface. The first slanted surfaces connect the second planar surface to the first planar surface. The first conformal connecting structures are disposed on the first planar surface and the first nitride-based chip. First obtuse angles are formed between the second planar surface and the first slanted surfaces. Each of the first conformal connecting structures covers one of the first slanted surfaces of the first nitride-based chip and one of the first obtuse angles and is electrically connected to the first conductive pads.
Public/Granted literature
- US20230031259A1 NITRIDE SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2023-02-02
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