Invention Grant
- Patent Title: Image sensor having different concentration of impurities in the channel regions and isolation elements
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Application No.: US17318231Application Date: 2021-05-12
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Publication No.: US12046616B2Publication Date: 2024-07-23
- Inventor: Seung Ki Baek , Kyung Ho Lee , Tae Sub Jung , Doo Sik Seol , Seung Ki Jung
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: HARNESS, DICKEY & PIERCE, P.L.C.
- Priority: KR 20200085255 2020.07.10
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
An image sensor includes a substrate, a first isolation region defining a unit pixel, a first photoelectric conversion region in the unit pixel, a second photoelectric conversion region in the unit pixel, the second photoelectric conversion region spaced apart from the first photoelectric conversion region, a floating diffusion region, the floating diffusion region adjacent to the first surface of the substrate, a first transfer gate on the first surface of the substrate, the first transfer gate between the first photoelectric conversion region and the floating diffusion region, and a second transfer gate on the first surface of the substrate, the second transfer gate between the second photoelectric conversion region and the floating diffusion region. At least a part of the first transfer gate is buried in the substrate, and a bottom surface of the first transfer gate is different in height from a bottom surface of the second transfer gate.
Public/Granted literature
- US20220013552A1 IMAGE SENSOR Public/Granted day:2022-01-13
Information query
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