Invention Grant
- Patent Title: Shutter system and inspection device
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Application No.: US17993880Application Date: 2022-11-24
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Publication No.: US12047665B2Publication Date: 2024-07-23
- Inventor: Sena Amemiya , Masaki Takamatsu , Jumpei Shiraishi , Kyohei Shibuya
- Applicant: NIDEC COPAL CORPORATION , FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIDEC COPAL CORPORATION,FUJIFILM CORPORATION
- Current Assignee: NIDEC COPAL CORPORATION,FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo; JP Tokyo
- Agency: HAUPTMAN HAM, LLP
- Priority: JP 22002953 2022.01.12
- Main IPC: H04N23/56
- IPC: H04N23/56 ; G01N21/78 ; G01N21/77

Abstract:
An inspection device includes a small shutter in an opening of an inspection chamber, and a large shutter behind the small shutter. The small shutter has a closed state, an inward-open state, and an outward-open state. The small shutter in the inward-open or outward-open state is pushed by a workpiece and pivots inward in or outward from the inspection chamber. The large shutter has a light-shielding state, a driven state, and a stationary state. The large shutter in the light-shielding state overlaps the small shutter in the closed state and closes a clearance between the opening and the small shutter. The large shutter in the driven state is pushed by the small shutter in the inward-open state and pivots with the small shutter. The large shutter in the stationary state is separate from the small shutter in the outward-open state and at a same position as in the light-shielding state.
Public/Granted literature
- US20230224568A1 SHUTTER SYSTEM AND INSPECTION DEVICE Public/Granted day:2023-07-13
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