Invention Grant
- Patent Title: Reconstituted substrate for radio frequency applications
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Application No.: US17872731Application Date: 2022-07-25
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Publication No.: US12051653B2Publication Date: 2024-07-30
- Inventor: Guan Huei See , Ramesh Chidambaram
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: H01L23/538
- IPC: H01L23/538 ; H01L21/48 ; H01L21/50 ; H01L21/768 ; H01L23/13 ; H01L23/14 ; H01L23/498 ; H01L23/66 ; H01L25/065 ; H01L25/10 ; H01L27/06 ; H01Q1/22 ; H01Q1/24 ; H05K1/02 ; H01L21/60

Abstract:
The present disclosure relates to methods and apparatus for forming thin-form-factor reconstituted substrates and semiconductor device packages for radio frequency applications. The substrate and package structures described herein may be utilized in high-density 2D and 3D integrated devices for 4G, 5G, 6G, and other wireless network systems. In one embodiment, a silicon substrate is structured by laser ablation to include cavities for placement of semiconductor dies and vias for deposition of conductive interconnections. Additionally, one or more cavities are structured to be filled or occupied with a flowable dielectric material. Integration of one or more radio frequency components adjacent the dielectric-filled cavities enables improved performance of the radio frequency elements with reduced signal loss caused by the silicon substrate.
Public/Granted literature
- US20220359409A1 RECONSTITUTED SUBSTRATE FOR RADIO FREQUENCY APPLICATIONS Public/Granted day:2022-11-10
Information query
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