Invention Grant
- Patent Title: System for storing chemical liquid and method for adjusting gas concentration in chemical liquid
-
Application No.: US16569489Application Date: 2019-09-12
-
Publication No.: US12053745B2Publication Date: 2024-08-06
- Inventor: Chun-Yu Kuo , Shang-Yun Huang , Weibo Yu , Shang-Yuan Yu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: B01F23/10
- IPC: B01F23/10 ; B01J8/00 ; H01L21/67
Abstract:
Chemical liquid is injected into a tank. A concentration of a first gas dissolved in the chemical liquid is detected. Based on the detected concentration of the first gas, at least one of the first gas and a second gas is injected into the tank to sustain at least one of the concentration of the first gas and a concentration of the second gas in a range of a target value.
Public/Granted literature
- US20210077958A1 SYSTEM FOR STORING CHEMICAL LIQUID AND METHOD FOR ADJUSTING GAS CONCENTRATION IN CHEMICAL LIQUID Public/Granted day:2021-03-18
Information query
